This inventor holds 3 USPTO granted patents. Top assignee: Rca Inc.. Active years: 1977-1986.
Location History:
- Burlington County, NJ (US) (1977)
- Mt. Laurel, NJ (US) (1978)
- Mercer County, NJ (US) (1986)
Company Filing History:
Years Active: 1977-1986
Title: Innovations of James John DiPiazza
Introduction
James John DiPiazza is an accomplished inventor based in Burlington, NJ (US). He holds a total of 3 patents that showcase his expertise in optical lithography and photoresist technologies. His innovative contributions have significantly advanced the field of photolithography.
Latest Patents
One of his latest patents is titled "Process of using absorptive layer in optical lithography with overlying." This patent discloses a multilayer, photoresist recording medium that comprises an absorptive layer and an oxygen plasma-resistant photoresist layer. The structure is designed to be substantially free of intermixing between the two layers and prevents separation of the photoresist layer during processing. The absorptive layer is formed through a two-step curing process involving a multifunctional acrylate or methacrylate monomer, a suitable dye, and a photoinitiator in a solvent. The composition is rapidly solidified by high-intensity irradiation and then baked to ensure complete polymerization.
Another significant patent is the "Nonreflecting photoresist process." In this invention, a light-absorbing medium is interposed between a photosensitive layer and the surface to eliminate surface effects caused by light reflection. This medium can be a quarter-wave plate or a filter that absorbs light within the energy spectrum sensitive to the photosensitive layer.
Career Highlights
James John DiPiazza is currently employed at RCA Inc., where he continues to innovate and contribute to advancements in optical technologies. His work has been instrumental in developing processes that enhance the performance and reliability of photoresist materials.
Collaborations
Throughout his career, DiPiazza has collaborated with notable colleagues, including Thomas R Pampalone and Ahmad H Khan. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
James John DiPiazza's contributions to the field of optical lithography and photoresist technologies are noteworthy. His innovative patents reflect his commitment to advancing the industry and improving the efficiency of photolithography processes.