James Gregory Goodberlet

Title: James Gregory Goodberlet: Innovator in Maskless Lithography

Introduction

James Gregory Goodberlet is a notable inventor based in Melrose, MA (US). He holds a total of 9 patents that contribute significantly to the field of lithography, particularly in maskless lithography technologies. His innovative approaches have paved the way for advancements in beam manipulation and optical element fabrication.

Latest Patents

One of Goodberlet's latest patents is titled "Spatial-phase locking of energy beams for determining two-dimensional location and beam shape." This method involves spatial-phase locking a beam used in maskless lithography, providing a fiducial grid with a single spatial-period. The system detects signals generated when the beam is incident upon the fiducial grid and determines the two-dimensional location of the beam from the phases of fundamental frequency components. Additionally, it assesses the size and shape of the beam based on relative amplitudes of frequency components. The method also includes correcting beam deflection and adjusting its size and shape as needed.

Another significant patent is the "System and method for fabrication and replication of diffractive optical elements for maskless lithography." This method outlines the formation of an array of focusing elements for lithography systems by varying exposure characteristics over an area. It includes steps such as providing a first pattern via lithography, depositing conductive absorber material, and etching to create a pattern aligned with the conductive material.

Career Highlights

Goodberlet has had a distinguished career, including his tenure at the Massachusetts Institute of Technology. His work has been instrumental in advancing technologies that enhance the capabilities of lithography systems.

Collaborations

Throughout his career, Goodberlet has collaborated with notable individuals such as Henry Ignatius Smith and Jeffrey Todd Hastings. These collaborations have further enriched his contributions to the field.

Conclusion

James Gregory Goodberlet's innovative work in maskless lithography and his numerous patents highlight his significant impact on the field. His advancements continue to influence the development of new technologies in optical systems.