The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2008
Filed:
Oct. 02, 2003
Dario Gil, Cambridge, MA (US);
Jeffrey T. Hastings, Cambridge, MA (US);
James G. Goodberlet, Melrose, MA (US);
Rajesh Menon, Boston, MA (US);
David J. Carter, Cambridge, MA (US);
Henry I. Smith, Sudbury, MA (US);
Dario Gil, Cambridge, MA (US);
Jeffrey T. Hastings, Cambridge, MA (US);
James G. Goodberlet, Melrose, MA (US);
Rajesh Menon, Boston, MA (US);
David J. Carter, Cambridge, MA (US);
Henry I. Smith, Sudbury, MA (US);
Massachusetts Institute of Technology, Cambridge, MA (US);
Abstract
A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments, the method includes the steps of providing a first pattern via lithography in a substrate, depositing a conductive absorber material on the substrate, applying an electrical potential to at least a first portion of the conductive absorber material, leaving a second portion of the conductive material without the electrical potential, and etching the second portion of the conductive material to provide a first pattern on the substrate that is aligned with the first portion of the conductive absorber material.