Scotia, NY, United States of America

James F Fleischer

This inventor holds 32 USPTO granted patents, primarily in Chemical Vapor Deposition. Top assignee: General Electric Company. Active years: 1990-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James F Fleischer. Retrieved from https://idiyas.com/inventor/james-f-fleischer

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 15

Forward Citations = 636(Granted Patents)


Company Filing History:


Years Active: 1990-1999

Loading Chart...
Areas of Expertise:
Chemical Vapor Deposition
CVD Diamond
Polycrystalline Diamond
Single-Crystal Diamond
Diamond Films
Diamond Coatings
Diamond Production
Diamond Toughness
Thin Diamond Films
Annealing Apparatus
Transparent Diamond Films
Graphite Suppression
32 patents (USPTO):Explore Patents

Title: The Innovative Contributions of James F. Fleischer: A Pioneer in Chemical Vapor Deposition

Introduction: James F. Fleischer, an accomplished inventor based in Scotia, NY, has made significant strides in the field of materials science with a remarkable portfolio of 32 patents. His groundbreaking work primarily focuses on methods of producing advanced materials through chemical vapor deposition (CVD), an area that has wide-ranging applications in various industries.

Latest Patents: Among Fleischer's latest innovations are two notable patents: one outlines a method of producing articles via chemical vapor deposition, and the other presents an improved method for creating diamond tubes using CVD techniques. The latter emphasizes a technique where a diamond film is deposited on the outer surface of a hollow mandrel. This mandrel is subsequently etched away from the inside, revealing that using hollow mandrels significantly reduces the etch time compared to traditional methods. Another of his recent inventions pertains to isotopically-pure carbon-12 and carbon-13 polycrystalline diamond, which boasts enhanced thermal conductivity. Fleischer discovered that while polycrystalline diamonds typically suffer from decreased thermal conductivity due to impurities and grain boundary scattering, those made from isotopically-pure carbon excel, disproving prior assumptions in the field.

Career Highlights: James F. Fleischer has dedicated his career to advancing the understanding and utility of diamond materials, particularly at General Electric Company. His extensive research has positioned him as a leader in applying innovative manufacturing techniques that leverage the unique properties of diamonds, demonstrating his commitment to pushing the boundaries of material science.

Collaborations: Throughout his career, Fleischer has collaborated with esteemed colleagues such as Thomas R. Anthony and Robert H. Ettinger. Together, they have contributed to significant advancements in their field, exploring the intersections of technology and advanced materials.

Conclusion: James F. Fleischer's impressive array of patents showcases his dedication to innovation in chemical vapor deposition and materials science. His pioneering work not only enhances the understanding of polycrystalline diamonds but also offers practical methods for their production, strengthening the foundation of industrial applications in the field. As he continues to innovate, Fleischer remains an inspiring figure for future generations of inventors and scientists.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…