James Edward Walsh

Title: Innovations by James Edward Walsh

Introduction

James Edward Walsh is a notable inventor based in West Lafayette, Indiana. He holds a total of 4 patents that showcase his contributions to the field of thick film circuits. His innovative methods have significantly advanced the manufacturing processes in this area.

Latest Patents

One of his latest patents is a "Print alignment method for multiple print thick film circuits." This invention improves the alignment between successive conductor print steps, making it both optically inspectable and electrically testable. The method includes a pair of adjacent alignment features with a non-conductive gap, ensuring that proper alignment is maintained. If misalignment occurs, it can be detected through impedance testing.

Another significant patent is the "Method of manufacturing a thick film circuit with improved dielectric." This method eliminates the trade-off between thickness and definition, allowing for thicker dielectric layers without pinholes. It utilizes a dielectric material that can be co-fired with an underlying conductor, enhancing the precision of dielectric features. The process minimizes spreading of the dielectric material, resulting in improved definition of vias and solder stops.

Career Highlights

James has worked with prominent companies such as Delco Electronics Corporation and Delphi Technologies, Inc. His experience in these organizations has contributed to his expertise in thick film circuit technology.

Collaborations

Throughout his career, James has collaborated with notable individuals, including Frans Peter Lautzenhiser and John Karl Isenberg. These collaborations have likely enriched his work and led to further innovations in his field.

Conclusion

James Edward Walsh's contributions to thick film circuit technology through his patents and career experiences highlight his role as an influential inventor. His innovative methods continue to impact the industry positively.