Hudson, NH, United States of America

James Edward Felton

This inventor holds 1 USPTO granted patent. Top assignee: Rohm & Haas Electronic Materials LLC. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: James Edward Felton. Retrieved from https://idiyas.com/inventor/james-edward-felton

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2005

Loading Chart...
1 patent (USPTO):Explore Patents

Title: The Innovative Journey of James Edward Felton

Introduction: James Edward Felton is a notable inventor based in Hudson, New Hampshire, whose contributions to the field of chemistry are marked by his innovative work with organometal compounds. With a single but impactful patent, Felton's research has opened up new possibilities in material science.

Latest Patents: Felton holds a patent for "Alkyl group VA metal compounds." This patent describes a method for preparing Group VA organometal compounds in high yield and high purity through the reaction of a Grignard reagent with a Group VA metal halide in specific ethereal solvents. Additionally, the patent also provides a method for preparing Group VA organometal hydrides, showcasing Felton's expertise in organometallic chemistry.

Career Highlights: Currently, James Edward Felton is associated with Rohm & Haas Electronic Materials LLC, a company well-regarded in the field of electronic materials. His work there has allowed him to contribute to cutting-edge research and development, particularly in the area of advanced chemical compounds.

Collaborations: Throughout his career, Felton has collaborated with esteemed colleagues such as Deodatta Vinayak Shenai-Khatkhate and Artashes Amamchyan. These collaborations have enriched his work and have helped advance the scientific community's understanding of organometallic compounds.

Conclusion: James Edward Felton's innovative contributions through his patent work signify his importance in the realm of chemistry. His ongoing efforts at Rohm & Haas Electronic Materials LLC reflect a commitment to advancing technology and scientific knowledge within the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…