This inventor holds 2 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Innovations by James E. Doran
Introduction
James E. Doran is a notable inventor based in Essex Junction, Vermont. He has made significant contributions to the field of semiconductor technology, particularly in lithographic processes. With a total of 2 patents, Doran's work has had a substantial impact on the industry.
Latest Patents
Doran's latest patents focus on advanced metrology techniques for critical image control in lithography. One of his key inventions is a method that utilizes three-dimensional feature metrology to implement critical image control and feedback of lithographic focus and x/y tilt. This method measures three-dimensional profile changes in a photo-sensitive film and provides compensatory exposure tool focus corrections. The goal is to maintain a stable lithographic process. The measured focus change from the optimal tool focus offset is monitored directly on critical product images for both contact hole and line images. Z focus corrections and x/y tilt corrections are fed back independently of dose to ensure critical dimension (CD) control, thereby improving semiconductor wafer printing. Additionally, this method can diagnose issues with the focusing system by measuring the relationship between line edge width and barometric pressure.
Career Highlights
James E. Doran is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the field of semiconductor technology. His work has been instrumental in enhancing the precision and reliability of lithographic processes.
Collaborations
Doran has collaborated with several esteemed colleagues, including Reginald R. Bowley, Jr. and Vincent J. Carlos. These collaborations have further enriched his contributions to the field.
Conclusion
James E. Doran's innovative work in lithography and metrology has significantly advanced semiconductor technology. His patents reflect a commitment to improving the stability and accuracy of lithographic processes, making him a valuable figure in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile