Oswego, IL, United States of America

James A Dirksen


Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 71(Granted Patents)


Company Filing History:


Years Active: 2001-2005

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6 patents (USPTO):Explore Patents

Title: James A. Dirksen: Innovator in Substrate Polishing Technologies

Introduction

James A. Dirksen is a notable inventor based in Oswego, IL (US). He has made significant contributions to the field of substrate polishing and planarization, holding a total of 6 patents. His work has been instrumental in advancing technologies that enhance the efficiency and effectiveness of surface treatment processes.

Latest Patents

Among his latest patents, Dirksen has developed a method of polishing or planarizing a substrate. This method involves abrading a portion of the surface of a substrate made of metal, metal oxide, or metal composite using a specific composition. This composition includes a metal oxide abrasive and a liquid carrier, with a pH of about 7 or less. The metal oxide abrasive is characterized by a total surface hydroxyl group density of no greater than about 3 hydroxyl groups per nm. Another significant patent focuses on a composition and method for planarizing surfaces. This composition comprises a liquid carrier, a chemical accelerator, and solids that include fumed metal oxide and abrasive particles. The innovative approach ensures high polishing efficiency, uniformity, and removal rate while minimizing defects.

Career Highlights

Dirksen has worked with Cabot Microelectronics Corporation, where he has contributed to the development of advanced polishing technologies. His expertise in the field has led to the creation of solutions that address the challenges faced in substrate polishing.

Collaborations

Throughout his career, Dirksen has collaborated with notable professionals, including Brian L. Mueller and Mingming Fang. These collaborations have further enriched his work and contributed to the advancements in substrate polishing technologies.

Conclusion

James A. Dirksen's innovative contributions to substrate polishing and planarization have established him as a key figure in the field. His patents reflect a commitment to enhancing surface treatment processes, making significant strides in technology.

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