This inventor holds 4 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1978-1989.
Company Filing History:
Years Active: 1978-1989
Title: Innovations of James A Bondur
Introduction
James A Bondur is a notable inventor based in Walden, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work primarily focuses on gas mixtures and etching processes that enhance the efficiency and precision of semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Gas mixture and method for anisotropic selective etch of nitride." This invention involves a gas mixture for selective dry etching of a nitride insulator layer relative to an oxide insulator layer. The mixture contains chlorine and oxygen, with the oxygen comprising 15% or less by volume. In a preferred embodiment for etching Si₃N₄ while leaving a layer of SiO₂, Cl₂ gas is combined with 12% or less oxygen by volume. This gas mixture achieves an etch selectivity of greater than five to one when a plasma RF frequency of less than 1 MHz is utilized. Additionally, when a high-frequency RF component in the range of 10-27 MHz is added, an etch uniformity of better than 3% is achieved.
Another significant patent is the "RIE process for etching silicon isolation trenches and polycides." This process discloses a method for etching semiconductor materials with a high etch rate against an insulator mask using a novel etchant gas mixture. The mixture consists of a chlorocarbon, SF₆, O₂, and an inert gas like He. The preferred gas mixture has a 2/1 ratio of chlorocarbon to SF₆, with a composition of 1-4% SF₆, 3-10% O₂, 74-93% He, and 3-10% chlorocarbon. This etchant gas mixture achieves a high etch rate of silicon against an oxide mask, typically in the range of 30-40.
Career Highlights
James A Bondur is currently employed at International Business Machines Corporation (IBM), where he continues to innovate in the semiconductor field. His work has been instrumental in advancing etching technologies that are crucial for modern electronics.
Collaborations
Throughout his career, Bondur has collaborated with notable colleagues, including Hans B Pogge and Nicholas J Giammarco. These collaborations have contributed