This inventor holds 1 USPTO granted patent. Top assignee: Other. Active years: 2001.
Company Filing History:
1 out of 834,350 Years Active: 2001
Title: Jain-Li Wu: Innovator in Particle Contamination Prevention
Introduction
Jain-Li Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of polishing technology, particularly in methods that prevent particle contamination during the polishing process. His innovative approach addresses a critical issue in the manufacturing of substrates, ensuring higher quality and efficiency.
Latest Patents
Jain-Li Wu holds a patent for a "Method and apparatus for preventing particle contamination in a polishing machine." This invention discloses a method that utilizes a slurry composition for material removal from substrate surfaces. The method is particularly effective in chemical mechanical polishing (CMP) apparatuses. It includes the use of multiple cleaning devices equipped with bendable, shapable conduits and spray nozzles to dispense cleaning solvents, such as deionized water, onto the chamber components. This innovative approach helps eliminate slurry deposits and reduces sources of particle contamination.
Career Highlights
Throughout his career, Jain-Li Wu has focused on enhancing the efficiency and cleanliness of polishing processes. His work has been instrumental in advancing technologies that are crucial for various manufacturing sectors. His patent reflects his commitment to innovation and quality in substrate processing.
Collaborations
Jain-Li Wu has collaborated with several professionals in his field, including Chih-Chiang Yang and Pei Wei Yeh. These collaborations have contributed to the development and refinement of his innovative methods.
Conclusion
Jain-Li Wu's contributions to the field of polishing technology demonstrate his dedication to innovation and quality. His patented method for preventing particle contamination is a testament to his expertise and commitment to advancing manufacturing processes.