Jai-man Baik

Title: Innovations of Jai-man Baik

Introduction

Jai-man Baik is a prominent inventor based in San Jose, California. He has made significant contributions to the field of integrated circuits, holding a total of six patents. His work focuses on enhancing the efficiency and packing density of MOS transistors used in integrated circuits.

Latest Patents

One of Jai-man Baik's latest patents is for a self-aligning contact and interconnect structure. This innovation allows for higher packing density in MOS transistors used in integrated circuits. The design features self-aligning source and drain contacts that overlap the gate while being insulated by oxide layers to prevent short circuits. Additionally, contacts to the gate are strategically placed on top of the gate over the active region of the transistor. This is achieved while protecting the source and drain regions with a hardened layer of photoresist during the etching process. The use of titanium silicide for contact protection ensures that interconnects do not need to cover these areas completely. Low resistance interconnects are formed from doped polysilicon, which is covered by titanium silicide and encapsulated in a thin film of titanium nitride.

Career Highlights

Jai-man Baik is currently employed at Paradigm Technology, Inc., where he continues to innovate in the field of integrated circuits. His work has been instrumental in advancing the technology used in modern electronics.

Collaborations

Throughout his career, Jai-man has collaborated with notable colleagues, including Norman Godinho and Hsiang-Wen Chen. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Jai-man Baik's contributions to the field of integrated circuits through his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the design and efficiency of electronic devices.