This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Disco Corporation. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: The Innovative Contributions of Jai Kwang Han
Introduction
Jai Kwang Han is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of polishing technology, particularly through his innovative patent. His work is recognized for enhancing the efficiency and effectiveness of polishing apparatuses used in various industries.
Latest Patents
Jai Kwang Han holds a patent for a polishing apparatus. This apparatus includes a chuck table, a rotation mechanism that rotates the chuck table around a predetermined rotation axis, and a polishing unit that features a spindle. The polishing pad, which is mounted on the lower end part of the spindle, is designed to polish wafers that are sucked and held by the holding surface. Additionally, the apparatus includes a slurry supply unit and a cleaning unit that effectively cleans the holding surface. The cleaning unit is equipped with a cleaning abrasive stone that removes slurry adhering to the holding surface by making contact with it. The positioning unit of the cleaning unit allows the cleaning abrasive stone to be positioned at both a cleaning position and an evacuation position. Notably, the hardness of the cleaning abrasive stone is lower than that of the holding surface, ensuring effective cleaning without damaging the apparatus.
Career Highlights
Jai Kwang Han is currently employed at Disco Corporation, where he continues to innovate and develop advanced polishing technologies. His work at Disco Corporation has positioned him as a key player in the field, contributing to the company's reputation for excellence in manufacturing and technology.
Collaborations
Some of Jai Kwang Han's coworkers include Toshiyuki Moriya and Takamasa Suzuki. Their collaboration fosters a creative environment that encourages innovation and the development of cutting-edge technologies.
Conclusion
Jai Kwang Han's contributions to polishing technology through his patent demonstrate his commitment to innovation and excellence. His work not only enhances the efficiency of polishing apparatuses but also reflects the collaborative spirit of his team at Disco Corporation.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile