Palo Alto, CA, United States of America

Jaehyung Lee


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations by Jaehyung Lee in Semiconductor Technology.

Introduction

Jaehyung Lee is a prominent inventor based in Palo Alto, CA, known for his contributions to semiconductor technology. He has developed innovative methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes. His work is particularly significant in the field of selective epitaxial growth.

Latest Patents

Jaehyung Lee holds a patent titled "Methods for forming a germanium island using selective epitaxial growth and a sacrificial filling layer." This patent describes a method for obtaining a semiconductor island by epitaxially growing a semiconductor structure over a substrate. The process involves using a mask layer to define specific regions and includes forming a filling layer over the semiconductor structure. The devices made by this method demonstrate improved performance and reliability.

Career Highlights

Jaehyung Lee is currently employed at Stratio Inc., where he continues to push the boundaries of semiconductor innovation. His work has led to advancements that are crucial for the development of next-generation electronic devices. With 1 patent to his name, he is recognized for his technical expertise and innovative thinking.

Collaborations

Jaehyung collaborates with talented individuals such as Yeul Na and Youngsik Kim, who contribute to the dynamic research environment at Stratio Inc. Their combined efforts foster a culture of innovation and creativity within the company.

Conclusion

Jaehyung Lee's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patent on selective epitaxial growth methods showcases his commitment to advancing technology and improving device performance.

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