Jaehyuk Chang

Title: Innovations of Jaehyuk Chang

Introduction

Jaehyuk Chang is a prominent inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of technology, particularly in image processing and photomask manufacturing. With a total of eight patents to his name, Chang's work reflects his expertise and innovative spirit.

Latest Patents

Chang's latest patents include a method for coloring a target image and a method of managing critical dimension error of photomask. The method for coloring a target image involves generating at least one target mask using a first artificial neural network, which has been trained. It also includes generating a reference mask that corresponds to the target mask and coloring the target mask in reference to the color of the reference mask. The final step is generating a colored target image using a second trained artificial neural network. The method of managing critical dimension error includes defining openings in a photomask, using graphs to obtain light intensity, and calculating the real width of the openings to enhance aerial image mask error.

Career Highlights

Throughout his career, Jaehyuk Chang has worked with notable companies such as Samsung Display Co., Ltd. and Naver Webtoon Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Chang has collaborated with talented individuals in his field, including Changhoon Kim and Kibeom Lee. These collaborations have fostered a creative environment that encourages the exchange of ideas and innovation.

Conclusion

Jaehyuk Chang's contributions to technology through his patents and collaborations highlight his role as a leading inventor. His innovative methods in image processing and photomask manufacturing continue to influence the industry.