Jae Uk Lee

Title: Innovations of Jae Uk Lee

Introduction

Jae Uk Lee is a notable inventor based in Yangsan-si, South Korea. He has made significant contributions to the field of technology, particularly in speech synthesis and lithography processes. With a total of two patents to his name, Lee's work showcases his innovative approach to solving complex problems.

Latest Patents

One of Jae Uk Lee's latest patents is a method and apparatus for synthesizing multi-speaker speech using an artificial neural network. This invention involves generating and storing a speech learning model for multiple users by training a synthetic artificial neural network based on their speech data. The method also includes generating speaker vectors for new users and determining the most similar speaker vector from previously learned users to create a personalized speech synthesis experience.

Another significant patent by Lee is related to a mask for extreme ultraviolet (EUV) lithography processes. This patent describes a mask that consists of a substrate and a reflection layer made of alternating material layers. The design includes a capping layer, a phase shift layer, and an absorber layer, which are crucial for enhancing the performance of EUV lithography.

Career Highlights

Jae Uk Lee is affiliated with the Industry-University Cooperation Foundation at Hanyang University. His role in this institution allows him to engage in cutting-edge research and development, contributing to advancements in technology and innovation.

Collaborations

Lee has collaborated with notable colleagues, including Jung Sik Kim and Jinho Ahn. These partnerships have likely fostered a creative environment that encourages the exchange of ideas and expertise.

Conclusion

Jae Uk Lee's contributions to the fields of speech synthesis and lithography highlight his innovative spirit and dedication to advancing technology. His patents reflect a commitment to solving real-world challenges through inventive solutions.