Gumi, South Korea

Jae Keun Kil

This inventor holds 1 USPTO granted patent. Top assignee: Radpion Inc.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jae Keun Kil. Retrieved from https://idiyas.com/inventor/jae-keun-kil

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2025

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Jae Keun Kil: Innovator in Material Surface Reforming Technology

Introduction

Jae Keun Kil is a prominent inventor based in Gumi-si, South Korea. He has made significant contributions to the field of material surface reforming through his innovative technologies. His work focuses on enhancing material properties using advanced techniques.

Latest Patents

Jae Keun Kil holds a patent for a "Material surface reforming apparatus using ion implantation." This apparatus includes a vacuum chamber unit designed to maintain a selective vacuum environment. It features a station for placing materials that require surface reforming. The invention incorporates a first ion implanter that generates plasma from ionized gas or metal particles, emitting a first ion beam towards the material. Additionally, a second ion implanter performs a similar function, enhancing the reforming process.

Career Highlights

Jae Keun Kil is associated with Radpion Inc., where he continues to develop and refine his innovative technologies. His work has positioned him as a key figure in the advancement of material surface reforming techniques.

Collaborations

He collaborates with notable colleagues, including Myung Jin Kim and Bom Sok Kim, who contribute to his research and development efforts.

Conclusion

Jae Keun Kil's contributions to material surface reforming technology highlight his innovative spirit and dedication to advancing the field. His patent and ongoing work at Radpion Inc. reflect his commitment to enhancing material properties through cutting-edge techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…