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Years Active: 2021
Title: Jae-hyun Yang: Innovator in Graphene Technology
Introduction
Jae-hyun Yang is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of materials science, particularly in the area of graphene technology. His innovative work has led to the development of a unique stacking structure that enhances the properties of graphene layers.
Latest Patents
Yang holds a patent for a "Stacking structure having material layer on graphene layer and method of forming material layer on graphene layer." This invention relates to a stacking structure where a material layer is formed on a graphene layer using an Atomic Layer Deposition (ALD) method. The patent outlines that an intermediate layer can be created as a seed layer on the graphene layer, utilizing a linear type precursor. This advancement has potential applications in various electronic devices.
Career Highlights
Throughout his career, Jae-hyun Yang has worked with notable organizations, including Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to groundbreaking research.
Collaborations
Yang has collaborated with several talented individuals, including Seong-jun Jeong and Seong-jun Park. These partnerships have fostered a creative environment that has led to innovative solutions in materials science.
Conclusion
Jae-hyun Yang's contributions to graphene technology and materials science are noteworthy. His patent and career achievements reflect his dedication to innovation and research in this dynamic field.