Company Filing History:
Years Active: 2019-2024
Title: Jae Hyoung Shim: Innovator in Gallium Nitride Substrate Fabrication
Introduction
Jae Hyoung Shim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the fabrication of gallium nitride substrates. With a total of 4 patents to his name, Shim's work is paving the way for advancements in electronic materials.
Latest Patents
One of Shim's latest patents is titled "Method of fabricating gallium nitride substrate using ion implantation." This invention relates to a technology that utilizes an ion implantation process combined with a self-separation technique to fabricate gallium nitride substrates. The method involves several steps, including the formation of a first gallium nitride layer, implanting hydrogen ions to create a separation layer, and self-separating the second gallium nitride layer from the first.
Another notable patent is the "Method for manufacturing gallium nitride substrate using the multi ion implantation." This method describes a process that employs multiple ion implantation techniques to fabricate gallium nitride substrates. Key steps include forming a bonding oxide film, performing ion implantation to create a damaged layer, and allowing the growth of a second gallium nitride layer using a seed layer.
Career Highlights
Jae Hyoung Shim is affiliated with the Industry-University Cooperation Foundation at Hanyang University. His work in this institution has allowed him to collaborate with other experts in the field and contribute to innovative research in semiconductor technology.
Collaborations
Shim has worked alongside notable colleagues such as Jea Gun Park and Tae Hun Shim. Their collaborative efforts have further enhanced the research and development of gallium nitride technologies.
Conclusion
Jae Hyoung Shim's innovative work in the fabrication of gallium nitride substrates showcases his expertise and commitment to advancing semiconductor technology. His contributions are significant in shaping the future of electronic materials.
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