Jae Hoon Hwang

Title: Jae Hoon Hwang: Innovator in Substrate Processing Technology

Introduction

Jae Hoon Hwang is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His innovative designs focus on improving the efficiency and effectiveness of semiconductor substrate treatment.

Latest Patents

One of Jae Hoon Hwang's latest patents is a substrate processing apparatus. This apparatus features a rotating table designed to support and rotate a substrate, along with collection cups that gather treatment solutions sprayed onto the substrate. The collection cups are strategically placed outside the rotating table and are equipped with spaces for collecting the treatment solution. The design includes a pair of lifting shafts and driving modules, with a unique combination of motor and hydraulic driving types to enhance functionality.

Another significant patent is a fluid supply nozzle for semiconductor substrate treatment. This nozzle is engineered to supply a treatment liquid, which is a mixture of various solutions, to a semiconductor substrate. The nozzle body is designed to mix these solutions effectively, creating a homogeneous treatment liquid. It features a solution supply channel and a rotary cartridge that accelerates the mixing process, ensuring optimal treatment for semiconductor substrates.

Career Highlights

Throughout his career, Jae Hoon Hwang has worked with companies such as Apet Co., Ltd. and Apet. His experience in these organizations has contributed to his expertise in substrate processing technologies and innovations.

Collaborations

Jae Hoon Hwang has collaborated with notable colleagues, including Tae Woo Kim and Sang Su Lee. Their combined efforts have further advanced the field of semiconductor substrate treatment.

Conclusion

Jae Hoon Hwang is a distinguished inventor whose work in substrate processing technology has led to innovative solutions in semiconductor treatment. His patents reflect a commitment to enhancing efficiency and effectiveness in this critical area of technology.