This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Semes Co., Ltd.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Jae Hoo Lee: Innovator in Substrate Processing Technology
Introduction
Jae Hoo Lee is a prominent inventor based in Gyeonggi-do, South Korea. He has made significant contributions to the field of substrate processing technology. His innovative work focuses on enhancing the uniformity of substrate processing, which is crucial in various industrial applications.
Latest Patents
Jae Hoo Lee holds a patent for an "Apparatus and method for processing substrate using plasma." This invention provides a substrate processing apparatus designed to increase the uniformity of substrate processing. The apparatus comprises a first space between an electrode and an ion blocker, a second space between the ion blocker and a shower head, and a processing space for processing a substrate under the shower head. The ion blocker features a first region and a second region that are separated from each other, along with multiple first supply ports for supplying a first reaction gas to the second space. The shower head includes regions corresponding to the ion blocker and a plurality of second supply ports for supplying a second reaction gas.
Career Highlights
Jae Hoo Lee is currently employed at Semes Co., Ltd., where he continues to develop innovative technologies in substrate processing. His work has been instrumental in advancing the capabilities of substrate processing equipment, making it more efficient and effective.
Collaborations
He collaborates with talented coworkers, including Min Sung Han and Yoon Jong Ju, who contribute to the innovative environment at Semes Co., Ltd. Their teamwork fosters creativity and drives the development of cutting-edge technologies.
Conclusion
Jae Hoo Lee is a notable inventor whose work in substrate processing technology has the potential to impact various industries significantly. His patent reflects his commitment to innovation and excellence in engineering.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
