Jae-hee Hwang

Title: **Jae-hee Hwang: Innovator in Photomask Technology**

Introduction

Jae-hee Hwang is a notable inventor based in Seongnam-si, South Korea, recognized for his contributions to the field of semiconductor technology. With a total of two patents to his name, Hwang's innovations have had significant implications in the manufacturing processes of semiconductor devices.

Latest Patents

Hwang's latest patents include advancements in photomask technology. The first patent details a photomask blank and a method of fabricating a photomask from the same. This photomask blank comprises a hard mask with superior etch selectivity relative to an opaque layer, featuring a light-transmissive substrate and an opaque chromium layer. The innovative design includes a hard mask layer made from a conductive material that possesses an etch selectivity of at least 3:1 against an etch gas mixture of chlorine and oxygen. Additionally, the method involves precise layering, including a resist layer and, optionally, a phase shift layer, which enhances the effectiveness of the photomask.

The second patent revolves around a method for manufacturing semiconductor devices, particularly improving alignment margins between contact holes and device patterns. This method introduces a layer with a uniquely tailored upper vertically shaped portion and a lower symmetrically inclined portion, ensuring better device performance through innovative design features.

Career Highlights

Hwang is currently employed at Samsung Electronics Co., Ltd., a leader in technology and innovation. His work contributes to advancements in semiconductor manufacturing, positioning the company at the forefront of industry developments. His patents reflect a commitment to enhancing existing technologies and creating solutions that benefit the semiconductor industry.

Collaborations

In his career, Hwang has collaborated with several talented individuals, including his coworkers Jeong-yun Lee and Ka-soon Yim. Their teamwork and shared knowledge within the company facilitate continuous improvement and innovation in technology, allowing them to push boundaries in semiconductor device manufacturing.

Conclusion

Jae-hee Hwang's inventive spirit and technological prowess have led to significant advancements in photomask technology and semiconductor device manufacturing. As an active contributor at Samsung Electronics Co., Ltd., his work not only reflects personal achievement but also enhances the capabilities of the industry as a whole. His patents serve as a testament to his role as an innovator and a valuable asset to the field of semiconductor technology.