This inventor holds 1 USPTO granted patent. Top assignee: Northeast Photo Sciences, Inc.. Active years: 1998.
Company Filing History:
Years Active: 1998
Title: Jacques J Ludman: Innovator in Environmental Monitoring Technology
Introduction
Jacques J Ludman is a notable inventor based in Hollis, NH (US). He has made significant contributions to the field of environmental monitoring through his innovative patent. His work focuses on developing advanced systems that enhance the detection and monitoring of environmental conditions.
Latest Patents
Jacques J Ludman holds a patent for an "Interferometric Environmental Monitor System for Monitoring the Presence." This system utilizes an active beam and a reference beam, each following distinct optical paths. The design includes a detector system with a detector assembly and a pair of reflecting elements. The first reflecting element receives the active beam and reflects it, while the second reflecting element does the same for the reference beam. The recombined beams are directed to the detector assembly, which monitors the central fringe of an interference pattern. This innovative approach allows for the detection of conditions that measurably affect the active beam, providing valuable output signals.
Career Highlights
Jacques J Ludman is associated with Northeast Photo Sciences, Inc., where he applies his expertise in environmental monitoring technologies. His work has contributed to advancements in the field, showcasing his commitment to innovation and research.
Collaborations
Jacques has collaborated with notable individuals in his field, including Jacques E Ludman and Henri John Caulfield. These collaborations have likely enriched his work and expanded the impact of his inventions.
Conclusion
Jacques J Ludman is a distinguished inventor whose work in environmental monitoring technology exemplifies innovation and dedication. His patent reflects a significant advancement in the field, contributing to better monitoring systems for environmental conditions.