Scottsdale, AZ, United States of America

Jacobus Johannes Beulens


Average Co-Inventor Count = 3.3

ph-index = 4

Forward Citations = 629(Granted Patents)


Location History:

  • Bilthoven, NL (2002)
  • Scottsdale, AZ (US) (2006 - 2009)

Company Filing History:


Years Active: 2002-2009

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4 patents (USPTO):Explore Patents

Title: The Innovations of Jacobus Johannes Beulens

Introduction

Jacobus Johannes Beulens is a prominent inventor based in Scottsdale, Arizona, known for his contributions to advanced materials and chemical processing technologies. With a total of four patents to his name, Beulens has significantly impacted the fields of semiconductor manufacturing and materials engineering.

Latest Patents

Among Beulens' latest innovations is his patent on Remote Plasma Activated Nitridation. This invention introduces a method where a nitrogen precursor, activated by exposure to a remotely excited species such as nitrogen, argon, or helium from a microwave radical generator, is employed as a reactant for creating nitrogen-containing layers. This technique allows for enhanced nitrogen incorporation compared to traditional methods, achieving superior results in nitriding already-deposited layers.

Another notable patent by Beulens is focused on Low Temperature Silicon Compound Deposition. This method outlines a sequential process for forming ultra-high quality silicon-containing compound layers, like silicon nitride, at low temperatures. By using trisilane as a silicon precursor and incorporating nitrogen radicals, Beulens' method achieves high-quality deposits while preventing unwanted gas phase reactions.

Career Highlights

Throughout his career, Beulens has been associated with significant companies in the semiconductor industry, including ASM International N.V. and ASM America, Inc. His expertise in chemical vapor deposition and materials science has been instrumental in his professional journey, leading to the development of cutting-edge technologies that cater to modern manufacturing demands.

Collaborations

During his tenure in the industry, Beulens has collaborated with talented professionals like Yuet Mei Wan and Ruben Haverkort. These collaborations have fostered an exchange of ideas and innovations, further pushing the boundaries of what is possible in semiconductor processing and materials development.

Conclusion

Jacobus Johannes Beulens stands out as an inventive force in the technology sector. His patents on remote plasma activated nitridation and low-temperature silicon compound deposition demonstrate his ability to innovate and address challenges in materials science. As he continues his work, Beulens' contributions will surely influence the future of semiconductor manufacturing and advanced material applications.

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