Eindhoven, Netherlands

Jacobus A Baggerman

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1995.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jacobus A Baggerman. Retrieved from https://idiyas.com/inventor/jacobus-a-baggerman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1995

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1 patent (USPTO):Explore Patents

Title: Jacobus A. Baggerman and Low-Temperature Substrate Treatment.

Introduction

Jacobus A. Baggerman is an inventor associated with Eindhoven, the Netherlands, and U.S. Philips Corporation. His patent work addresses the efficient and uniform cooling of substrates to very low temperatures.

Latest Patents

Baggerman is credited with 1 patent: “Device for the Treatment of Substrates at Low Temperature.” The invention describes a process chamber containing a substrate holder with a support plate. The plate’s underside forms part of a cooling chamber through which cooling liquid flows. Its wall has two portions shaped to guide the liquid, with the outlet positioned beside the less-projecting portion. This arrangement is designed to cool a substrate efficiently and homogeneously, potentially down to the temperature of liquid nitrogen.

Career Highlights

Baggerman’s documented patent contribution focuses on substrate cooling technology. The patent identifies U.S. Philips Corporation as his company affiliation.

Collaborations

Pieter J. van Voorst Vader and Ronnie A. Hack are listed as Baggerman’s coworkers. Their names appear alongside his in connection with the patent information provided.

Conclusion

Jacobus A. Baggerman’s patent presents a cooling-chamber design intended to improve the uniformity and efficiency of low-temperature substrate treatment.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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