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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5427670 B1

PDFFull Text
Date of Patent:
Jun. 27, 1995

Filed:

Nov. 10, 1993

Device for the treatment of substrates at low temperature

Applicant:
Inventors:

Jacobus A Baggerman, Eindhoven, NL;

Ronnie A Hack, Eindhoven, NL;

Pieter J Van Voorst Vader, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorneys:

Miller; Paul R.

Balconi-Lamica; Michael J.

Primary Examiner:

Nam Nguyen

Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429809 ; 20429815 ; 156345 ;
Abstract

A device is set forth for the treatment of substrates at low temperature, which device is provided with a process chamber (1) in which a holder (2) is arranged which is provided with a support plate (3) having an upper side (4) on which a substrate (5) can be placed, and having a lower side (6) which forms a wall (7) of a cooling chamber (8). The cooling chamber (8) is provided with an inlet (9) comprising a feed opening (10) and an outlet (11, 12) comprising a drain opening (13) through which a cooling liquid can be passed into and from the cooling chamber (8). A first portion (23) of the wall (7) of the cooling chamber (8) formed by the lower side (6) of the support plate (3) projects further into the chamber (8) than does a second portion (20), while the first and the second portion (23, 20, respectively) merge fluently into one another. The drain opening (13) of the outlet (11, 12) of the cooling chamber (8) is positioned adjacent the second portion (20) of the wall (7). In such a device, a substrate (5) can be cooled in an efficient and homogeneous manner down to the temperature of, for example, liquid nitrogen.

Find Patent Forward Citations

Baggerman, Jacobus. (1995). Device for the treatment of substrates at low temperature (U.S. Patent No. 5427670). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5427670

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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