Anaheim, CA, United States of America

Jack E Mee

This inventor holds 2 USPTO granted patents. Top assignee: Rockwell International Corporation. Active years: 1976.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jack E Mee. Retrieved from https://idiyas.com/inventor/jack-e-mee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1976

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2 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Inventor Jack E. Mee

Introduction: Jack E. Mee, an accomplished inventor based in Anaheim, California, has made significant contributions to the field of materials science through his innovative approaches to composite structures and crystal films. With a total of two patents to his name, Mee’s work encapsulates the essence of creativity and ingenuity that drives technological advancements.

Latest Patents: Jack E. Mee's latest inventions include a groundbreaking patent titled "Method for Producing Single Crystal Films." This innovation involves a unique process where the reaction zone for depositing a metal oxide film on a crystal substrate is systematically controlled during a chemical vapor deposition process. Additionally, his other recent patent, "Method of Forming a Composite Structure," describes a composite made up of multiple layered structures. This invention allows for the creation of single wall magnetic domains that can be manipulated within the film, enhancing their application in memory and logic circuits.

Career Highlights: Mee is currently associated with Rockwell International Corporation, where he continues to explore innovative methodologies in material design and application. His work aligns with the company’s commitment to advancing technology and engineering, making him a vital member of their research team.

Collaborations: During his career, Mee has had the pleasure of collaborating with esteemed colleagues such as Thomas N. Hamilton and David M. Heinz. These partnerships not only fostered innovation but also contributed to the successful development of high-impact technologies that have applications across various industries.

Conclusion: Jack E. Mee stands out as a remarkable inventor whose patents reflect significant advancements in the realm of material sciences. His dedication to innovation and collaboration within Rockwell International Corporation continues to inspire new ideas and applications in technology, solidifying his legacy in the world of invention.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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