The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 23, 1976
Filed:
Mar. 02, 1972
Jack E Mee, Anaheim, CA (US);
David M Heinz, Orange, CA (US);
Thomas N Hamilton, Fullerton, CA (US);
Paul J Besser, Mission Viejo, CA (US);
George R Pulliam, Anaheim, CA (US);
Rockwell International Corporation, El Segundo, CA (US);
Abstract
A composite consisting of multiple layer structures, the basic structure of which is a chemically vapor deposited film on a substrate wafer is, disclosed herein. The film is of material which is appropriate for creating therein single wall magnetic domains which are capable of being moved about in predetermined directions within the thickness of the film and in the plane of the film. Devices are adapted to the film for sensing the motion of these domains, thereby enabling application of these structures to circuits which may be particularly utilized in memory or logic applications. A complete family of film on substrate materials is fabricated through a unique process. One of the steps of the process relates to the establishment within a reactor of the exact location of the substrate upon which deposition of the film is to be made. This is done in order to obtain desired film characteristics. Included are provisions for making multiple film layers as a matrix of films and hence a multitude of such circuits. Films used are comprised of at least three and four elements.