Palm Bay, FL, United States of America

Jack E Clark, Ii


Average Co-Inventor Count = 2.0

ph-index = 2

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 1989-1995

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3 patents (USPTO):Explore Patents

Title: Jack E Clark, II: Innovator in Semiconductor Technology

Introduction

Jack E Clark, II is a notable inventor based in Palm Bay, FL (US). He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

One of his latest patents is titled "SOI CMOS device having body extension for providing sidewall channel." This invention involves an SOI/SOS thin film MOS mesa architecture that extends the body/channel region beyond the source and drain regions. The design increases impurity concentration at a selected portion of the extended body region, allowing for effective bias voltage termination and interruption of current leakage paths. Another significant patent is "Photocurrent compensation using active devices." This patent describes a current mirror with an amplification factor K that provides photocurrent compensation to a node with a mismatch of junction photocurrent. The innovative design ensures that the load device on the input leg of the current mirror is optimized for performance.

Career Highlights

Jack E Clark, II is currently employed at Harris Corporation, where he continues to develop cutting-edge technologies in the semiconductor industry. His expertise and innovative mindset have positioned him as a valuable asset to the company.

Collaborations

Throughout his career, Jack has collaborated with talented individuals such as Jeffrey C Lee and Brent R Doyle. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Jack E Clark, II exemplifies the spirit of innovation in the semiconductor field. His contributions through patents and collaborations highlight his commitment to advancing technology. His work continues to influence the industry and inspire future inventors.

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