Seongnam, South Korea

Ja-Young Choi

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2006-2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ja-Young Choi. Retrieved from https://idiyas.com/inventor/ja-young-choi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Seoul, KR (2006)
  • Seongnam-si, KR (2009)

Company Filing History:


Years Active: 2006-2009

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2 patents (USPTO):Explore Patents

Title: Ja-Young Choi: Innovator in Image Device Manufacturing

Introduction

Ja-Young Choi is a prominent inventor based in Seongnam, South Korea. He has made significant contributions to the field of image device manufacturing, holding a total of 2 patents. His work focuses on innovative methods that enhance the efficiency and effectiveness of image devices.

Latest Patents

Ja-Young Choi's latest patents include groundbreaking methods of manufacturing an image device. In this method, a first structure is created on a substrate with a photodiode, which consists of a transparent lower portion and an opaque upper portion. An etch stop layer pattern is then formed over the photodiode on this first structure. Following this, a second structure with at least one opaque capping layer is added to cover the etch stop layer pattern. An opening is created to partially expose the lower portion of the first structure by etching through the second structure, the etch stop layer pattern, and the opaque upper portion of the first structure.

Another notable patent is a method for forming a fuse integrated with a dual damascene process. This method involves creating an interconnection pattern and a fuse pattern on a substrate using a damascene process. A passivation layer is applied over the substrate's surface, and then it is patterned to form a pad opening that reveals part of the interconnection pattern. A metal pad is formed in this opening, extending over the passivation layer, while the passivation layer on the fuse pattern is partially etched to create a fuse opening.

Career Highlights

Ja-Young Choi is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and develop new technologies in the field of image devices. His work has been instrumental in advancing the capabilities of imaging technology.

Collaborations

One of his notable collaborators is Ki-Young Lee, who is also a talented professional in the field. Their partnership has contributed to the success of various projects at Samsung Electronics.

Conclusion

Ja-Young Choi's contributions to the field of image device manufacturing are noteworthy. His innovative patents and collaborations highlight his commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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