The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2009
Filed:
Dec. 20, 2005
Applicant:
Ja-young Choi, Seongnam-si, KR;
Inventor:
Ja-Young Choi, Seongnam-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In methods of manufacturing an image device, a first structure including a transparent lower portion and an opaque upper portion is formed on a substrate having a photodiode. An etch stop layer pattern positioned over the photodiode is formed on the first structure. A second structure having at least one opaque capping layer is formed on the first structure to cover the etch stop layer pattern. An opening partially exposing the lower portion of the first structure is formed over the photodiode by etching the second structure, the etch stop layer pattern and the opaque upper portion of the first structure.