J Michael Donahue

Title: J Michael Donahue: Innovator in Radiation Dosimetry

Introduction

J Michael Donahue is a notable inventor based in Oakland, NJ (US). He has made significant contributions to the field of radiation dosimetry, holding a total of six patents. His work focuses on developing methods that enhance the accuracy and reliability of radiation measurement devices.

Latest Patents

One of J Michael Donahue's latest patents is a method for manufacturing a calibrated radiation dosimeter. This innovative method involves applying a layer of radiation-sensitive material to a substrate. The optical density of this material varies according to the degree of radiation exposure. Initially, a pre-exposure optical density is measured, followed by exposure to a known dose of radiation. After exposure, a post-exposure optical density is measured. By utilizing these measurements, mathematical parameters are computed to define a predetermined mathematical function. These parameters are then encoded and applied to the substrate, enhancing the functionality of the dosimeter.

Career Highlights

J Michael Donahue has established himself as a key figure in the field of radiation measurement. His patents reflect a deep understanding of the complexities involved in accurately measuring radiation exposure. His work has implications for various industries, including healthcare and safety.

Collaborations

Throughout his career, J Michael Donahue has collaborated with notable professionals such as David F Lewis and Henry Seiwatz. These collaborations have contributed to the advancement of his innovative projects and patents.

Conclusion

J Michael Donahue's contributions to radiation dosimetry through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the field positively, ensuring safer and more accurate radiation measurement practices.