Anderson, SC, United States of America

J Matthew Mann


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2015-2016

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3 patents (USPTO):Explore Patents

Title: J Matthew Mann: Innovator in Laser Technology

Introduction

J Matthew Mann is a notable inventor based in Anderson, SC (US), recognized for his contributions to the field of laser technology. He holds a total of 3 patents that focus on the development of advanced laser materials and methods.

Latest Patents

Mann's latest patents include innovative methods for forming heterogeneous single garnet-based crystals for passive Q-switched lasers and microlasers. These patents disclose techniques for creating monolithic crystals that contain both a garnet-based activator region and a garnet-based Q-switch. The methods involve hydrothermal growth techniques that allow for the formation of differing epitaxial layers on a host material.

Another significant patent involves heterogeneous single vanadate-based crystals for Q-switched lasers and microlasers. Similar to his garnet-based work, this patent outlines methods for creating monolithic crystals with a vanadate-based activator region and a vanadate-based Q-switch. The techniques also utilize hydrothermal growth methods to achieve controlled thickness in the regions formed.

Career Highlights

Mann is affiliated with Clemson University, where he continues to advance research in laser technology. His work has significantly impacted the development of high-power laser systems, particularly in the area of pulse generation.

Collaborations

Mann has collaborated with esteemed colleagues such as Joseph William Kolis and Colin D McMillen, contributing to the advancement of laser technology through shared expertise and innovative research.

Conclusion

J Matthew Mann's contributions to the field of laser technology through his patents and research at Clemson University highlight his role as a leading inventor in this specialized area. His work continues to influence advancements in high-power laser systems.

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