Jörg Frederik Blumrich

Title: Jörg Frederik Blumrich: Innovator in Photolithography

Introduction

Jörg Frederik Blumrich is a notable inventor based in Jena, Germany. He has made significant contributions to the field of photolithography, particularly in the extreme ultraviolet (EUV) wavelength range. With a total of 2 patents, his work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Blumrich's latest patents include a "Method and apparatus for examining an element of a photolithographic mask for the EUV range." This patent describes a method that involves examining elements with light in the EUV wavelength range and determining their behavior. Another significant patent is for a "Method for localizing defects on substrates," which utilizes a phase contrast optical unit with a phase mask to examine substrates for EUV masks.

Career Highlights

Throughout his career, Blumrich has worked with prominent companies in the industry. He has been associated with Carl Zeiss SMT GmbH and Carl Zeiss AG, where he has contributed to various innovative projects. His expertise in photolithography has positioned him as a key figure in advancing EUV technology.

Collaborations

Blumrich has collaborated with several professionals in his field, including Jan Hendrik Peters and Dirk Seidel. These collaborations have further enriched his work and contributed to the development of cutting-edge technologies in photolithography.

Conclusion

Jörg Frederik Blumrich's contributions to the field of photolithography, particularly in EUV technology, highlight his role as an influential inventor. His patents and collaborations reflect his commitment to innovation and excellence in the industry.