The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2019
Filed:
Dec. 12, 2017
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Jörg Frederik Blumrich, Jena, DE;
Johannes Ruoff, Aalen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/33 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G01N 21/33 (2013.01); G01N 21/956 (2013.01); G01N 2021/95676 (2013.01);
Abstract
The present application relates to a method for examining at least one element of a photolithographic mask for an extreme ultraviolet (EUV) wavelength range, wherein the method includes the steps of: (a) examining the at least one element with light in the EUV wavelength range; and (b) determining the behavior of the at least one element in the EUV wavelength range.