Tochigi, Japan

Izuo Iida


Average Co-Inventor Count = 1.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2005-2008

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3 patents (USPTO):Explore Patents

Title: Izuo Iida: Innovator in Semiconductor Manufacturing

Introduction

Izuo Iida is a notable inventor based in Tochigi, Japan, recognized for his contributions to semiconductor device manufacturing. With a total of three patents to his name, Iida has made significant advancements in the field, particularly in enhancing the performance and reliability of semiconductor devices.

Latest Patents

Iida's latest patents include a method of manufacturing a semiconductor device with a capacitor and transistor. This invention aims to prevent dielectric breakdown of a capacitor in a semiconductor device that incorporates both a capacitor and a MOS transistor on the same substrate. The process involves forming a SiO film as a gate insulation film on a P-type semiconductor substrate. A photoresist layer is selectively applied in the MOS transistor formation region, allowing for precise etching that protects the edges of trench isolation films adjacent to the capacitor formation region. This careful approach ensures that the remaining SiO film serves effectively as a capacitor insulation film.

Another significant patent by Iida is a semiconductor device manufacturing method that allows for the easy formation of a memory transistor and a high breakdown voltage MOS transistor on the same substrate without altering the operational characteristics of the memory transistor. This method separates the processes of forming the tunnel insulation film of the memory transistor and the gate insulation film of the MOS transistor, enhancing efficiency and performance.

Career Highlights

Izuo Iida is currently employed at Sanyo Electric Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in developing methods that improve the functionality and durability of semiconductor devices.

Collaborations

Iida has collaborated with notable colleagues, including Tatsuya Fujishima and Mikio Fukuda, contributing to advancements in semiconductor manufacturing techniques.

Conclusion

Izuo Iida's innovative work in semiconductor device manufacturing has led to significant improvements in the industry. His patents reflect a deep understanding of the complexities involved in semiconductor technology, making him a valuable contributor to the field.

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