Company Filing History:
3 out of 21,351 
3 out of 832,912 Years Active: 2003-2011
Title: Innovations of Izumi Oya in Substrate Treatment Technologies
Introduction
Izumi Oya is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of substrate treatment technologies, holding a total of 6 patents. Her innovative approaches have advanced the efficiency and effectiveness of processes involving photoresist films.
Latest Patents
One of her latest patents is an apparatus for removing photoresist film. This apparatus includes a reacting chamber, an ozonizer that produces a gas supplied to the chamber, and an exhaust system for removing the gas. The design features a source of photoresist film-remover positioned opposite a stage that carries a substrate covered with photoresist. The apparatus allows for the simultaneous supply of the photoresist film-remover and gas to the substrate through apertures, with the potential to generate an electric field between the source and the substrate. Another notable patent is a substrate treatment apparatus that maintains the substrate at elevated temperatures. This apparatus includes a wetting device that produces a wet ozone-containing gas and a supply device that delivers this gas to the substrate's surface.
Career Highlights
Throughout her career, Izumi Oya has worked with notable companies, including Mitsubishi Electric Corporation. Her work has focused on developing advanced technologies that enhance substrate treatment processes, making her a key figure in her field.
Collaborations
Izumi has collaborated with esteemed colleagues such as Masaki Kuzumoto and Seiji Noda. These partnerships have contributed to her innovative projects and the successful development of her patents.
Conclusion
Izumi Oya's contributions to substrate treatment technologies reflect her dedication to innovation and excellence. Her patents demonstrate her ability to address complex challenges in the industry, solidifying her reputation as a leading inventor.