Kanagawa, Japan

Iwao Kurokawa

This inventor holds 9 USPTO granted patents. Top assignees: Komatsu Corporation, Kabushiki Kaisha Komatsu Seisakusho. Active years: 1993-2001.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Iwao Kurokawa. Retrieved from https://idiyas.com/inventor/iwao-kurokawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 8

Forward Citations = 314(Granted Patents)


Location History:

  • Yokohama, JP (1993 - 1996)
  • Kanagawa-ken, JP (1998)
  • Hiratsuka, JP (1999 - 2001)

Company Filing History:


Years Active: 1993-2001

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9 patents (USPTO):Explore Patents

Title: Iwao Kurokawa: Innovator in Plasma Arc Technology

Introduction

Iwao Kurokawa is a notable inventor based in Kanagawa-ken, Japan. He has made significant contributions to the field of plasma arc technology, holding a total of 9 patents. His work has been instrumental in advancing the capabilities of plasma arc torches.

Latest Patents

Among his latest innovations is the "Nozzle for a Plasma Arc Torch," which showcases his expertise in enhancing the efficiency and performance of plasma cutting tools. This invention is a testament to his commitment to improving industrial processes.

Career Highlights

Kurokawa has had a distinguished career, working with prominent companies such as Komatsu Corporation and Kabushiki Kaisha Komatsu Seisakusho. His experience in these organizations has allowed him to develop and refine his innovative ideas in a practical setting.

Collaborations

Throughout his career, Kurokawa has collaborated with talented individuals, including Toshiya Shintani and Yoshitaka Niigaki. These partnerships have contributed to the successful development of his inventions.

Conclusion

Iwao Kurokawa's contributions to plasma arc technology and his impressive portfolio of patents highlight his role as a leading inventor in his field. His work continues to influence advancements in industrial applications.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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