The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 1996
Filed:
Oct. 06, 1994
Yozo Nishi, Hiratsuka, JP;
Iwao Kurokawa, Yokohama, JP;
Kabushiki Kaisha Komatsu Seisakusho, Tokyo, JP;
Abstract
A stand-off control apparatus for plasma processing machines which is capable of maintaining an optimum stand-off even when a processing speed varies. In a stand-off control apparatus for plasma processing machines which is provided with a microcomputer (4) for maintaining an optimum stand-off (h.sub.0) by moving a torch toward/away from a work so that an independently inputted arc voltage (V) agrees with a speed-corrected target arc voltage (V.sub.O(F)) obtained by correcting a target arc voltage (V.sub.O), which is stored in advance, for an independently inputted processing speed (F), the microcomputer (4) determines at the time of varying a processing speed (F) whether the speed is being accelerated, being decelerated or being kept unchanged, and provides that the speed-corrected target arc voltage (V.sub.O(F)) for the respective case is applied after the lapse of a corresponding delay time (.DELTA.t) which is independently stored.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile