This inventor holds 1 USPTO granted patent. Top assignee: Kansai Paint Company, Ltd.. Active years: 2009.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2009
Title: Iwao Hayashi: Innovator in Semiconductor Technology
Introduction
Iwao Hayashi is a notable inventor based in Hiratsuka, Japan. He has made significant contributions to the field of semiconductor technology. His innovative approach has led to the development of a unique method for forming semiconductor films.
Latest Patents
Hayashi holds a patent titled "Method for forming semiconductor film and use of semiconductor film." This invention provides a process for forming a semiconductor film by applying a semiconductor particle dispersion liquid to a substrate surface through spray coating. The atomized droplets of the dispersion liquid have a mean diameter of about 30 µm or less. The process concludes with drying the coating to create a porous semiconductor film, which has various applications.
Career Highlights
Iwao Hayashi is associated with Kansai Paint Company, Ltd., where he has been instrumental in advancing semiconductor technologies. His work has garnered attention for its practical applications in the industry.
Collaborations
Hayashi collaborates with Masahide Kawaraya, contributing to the innovative projects at their company.
Conclusion
Iwao Hayashi's contributions to semiconductor technology through his patented methods highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile