The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Oct. 10, 2003
Masahide Kawaraya, Hiratsuka, JP;
Iwao Hayashi, Hiratsuka, JP;
Masahide Kawaraya, Hiratsuka, JP;
Iwao Hayashi, Hiratsuka, JP;
Kansai Paint Co., Ltd., Amagasaki-shi, JP;
Abstract
The present invention provides a process for forming a semiconductor film, comprising the steps of applying a semiconductor particle dispersion liquid to a substrate surface by spray coating in such a manner that the atomized droplets of the dispersion liquid discharged from the spray coater have a mean diameter of about 30 μm or less, and drying the coating to form a porous semiconductor film; and use of the semiconductor film obtained by the process.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile