Ivan Fu

Title: Innovations of Ivan Fu in Integrated Circuit Technology

Introduction

Ivan Fu is a notable inventor based in Tianjin, China. He has made significant contributions to the field of integrated circuit technology. With a total of 2 patents to his name, his work reflects a commitment to advancing electronic device design and functionality.

Latest Patents

One of Ivan Fu's latest patents is a "Potted integrated circuit device with aluminum case." This innovative device includes a die, a lead, and an electrically-conductive structure that facilitates electrical communication between the die and the lead. The device is designed with a potting material that embeds the electrically conductive structure, the die, and part of the lead. An electrically-conductive housing encases the potting material, forming the exterior packaging of the device. During manufacturing, the arrangement of the electrically-conductive structure, the die, and the lead can occur either before or after the potting material is placed in the housing. When the integrated circuit device operates, heat is effectively removable from the die through a thermal conduction path created by the electrically-conductive structure, the potting material, and the housing.

Career Highlights

Ivan Fu is currently employed at Vishay General Semiconductor, Inc., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in developing efficient and reliable integrated circuit devices.

Collaborations

Ivan has collaborated with notable coworkers such as Peter Chou and Lucy Tian. Their combined expertise contributes to the innovative environment at Vishay General Semiconductor, Inc.

Conclusion

Ivan Fu's contributions to integrated circuit technology demonstrate his dedication to innovation and excellence in the field. His patents reflect a deep understanding of electronic device design, paving the way for future advancements.