Iu-Ren Chen

Title: Iu-Ren Chen: Innovator in Lithography Processes

Introduction

Iu-Ren Chen is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of lithography, particularly in processes that enhance focus monitoring and control. His innovative approach has led to advancements that are crucial for the semiconductor industry.

Latest Patents

Iu-Ren Chen holds a patent titled "Method and structure for lithography processes with focus monitoring and control." This patent describes a method for lithography exposing processes that includes performing a first lithography exposing process to a resist layer using a mask with focus-sensitive and energy-sensitive patterns. The method involves measuring critical dimensions (CDs) of the transferred patterns on the resist layer, extracting Bossung curves from the CDs, and determining the slopes of these curves. This innovative method is essential for improving the accuracy and efficiency of lithography processes.

Career Highlights

Iu-Ren Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company has allowed him to apply his expertise in lithography and contribute to the development of cutting-edge technologies.

Collaborations

Iu-Ren Chen has collaborated with notable colleagues, including Jhih-Yu Wang and Chien-Yu Li. These collaborations have fostered an environment of innovation and have led to significant advancements in their respective fields.

Conclusion

Iu-Ren Chen's contributions to lithography processes exemplify the importance of innovation in the semiconductor industry. His patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key inventor in this field.