Iton Wang

Title: Iton Wang: Innovator in Integrated Circuit Technology

Introduction

Iton Wang is a notable inventor based in Cupertino, CA, who has made significant contributions to the field of integrated circuit technology. With a total of 2 patents to his name, Wang's work focuses on enhancing the performance and reliability of integrated circuits.

Latest Patents

Wang's latest patents include innovative designs for integrated circuit barrier structures. One of his patents describes a barrier metal integrated circuit structure that features relatively thin, highly nitrided layers of TiW (TiW:N) straddling a central conductor layer. This design is complemented by adjacent layers of relatively thick, substantially un-nitrided TiW material. The fabrication method involves the deposition of layers of TiW and TiW:N in a nitrogen-dominated atmosphere, which effectively establishes a barrier to the migration of conductor materials from the conductor layer. Another patent outlines similar methods for creating integrated circuit barrier structures, emphasizing the importance of backsputtering and backbias conditions to achieve optimal nitrogen saturation in the TiW:N layers.

Career Highlights

Throughout his career, Iton Wang has worked with prominent companies, including Hewlett-Packard Company. His expertise in integrated circuit technology has positioned him as a valuable asset in the tech industry.

Collaborations

Wang has collaborated with notable professionals in his field, including James Bernard Kruger and S. Jeffrey Rosner. These collaborations have likely contributed to the advancement of his innovative work.

Conclusion

Iton Wang's contributions to integrated circuit technology through his patents and collaborations highlight his role as a significant inventor in the tech industry. His innovative approaches continue to influence the development of reliable and efficient integrated circuits.