István Nagy

Title: The Innovations of István Nagy

Introduction

István Nagy is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography through his innovative methods and technologies. His work is particularly recognized for its impact on precision measurement in various applications.

Latest Patents

One of István Nagy's most recent patents is titled "Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus." This patent describes a method for determining a mark measurement sequence for an object that includes multiple marks. The process involves receiving location data for the marks to be measured, obtaining a boundary model of a positioning device used for the measurement, and determining the mark measurement sequence based on the location data and the boundary model. This innovation enhances the accuracy and efficiency of lithographic processes.

Career Highlights

István Nagy is currently employed at ASML Netherlands B.V., a leading company in the field of lithography and semiconductor manufacturing. His role at ASML allows him to work on cutting-edge technologies that drive advancements in the industry. His expertise and innovative mindset have contributed to the company's reputation as a pioneer in lithographic equipment.

Collaborations

István has collaborated with talented colleagues such as Özer Duman and Arjan Gijsbertsen. These collaborations have fostered a creative environment that encourages the development of new ideas and solutions in the field of lithography.

Conclusion

István Nagy is a distinguished inventor whose work in lithography has led to significant advancements in measurement techniques. His contributions continue to influence the industry and inspire future innovations.