Yamanashi, Japan

Isei Imahashi

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isei Imahashi. Retrieved from https://idiyas.com/inventor/isei-imahashi

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1

Forward Citations = 231(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Isei Imahashi: Innovator in Plasma Processing Technology

Introduction

Isei Imahashi is a notable inventor based in Yamanashi-ken, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus that enhances the efficiency of semiconductor manufacturing.

Latest Patents

Isei Imahashi holds a patent for a plasma processing apparatus. This apparatus includes a chamber with a gas inlet port and a gas discharge port. It features a rest table for supporting a wafer with a surface to be processed. The apparatus also incorporates a radio frequency antenna that supplies radio frequency energy into the chamber, generating induced plasma. A radio frequency voltage source applies voltage to the antenna, while a measurement system monitors pressure and light variations in the chamber during plasma generation. The voltage source is controlled based on signals from the measurement system, allowing for precise adjustments according to the chamber's conditions. He has 1 patent to his name.

Career Highlights

Isei Imahashi is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing plasma processing technologies. His expertise and innovative mindset have contributed to the company's reputation for excellence in the field.

Collaborations

Isei Imahashi has collaborated with notable colleagues, including Nobuo Ishii and Jiro Hata. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Isei Imahashi's contributions to plasma processing technology exemplify the spirit of innovation in the semiconductor industry. His patent and work at Tokyo Electron Limited highlight his role as a key figure in advancing manufacturing processes. His dedication to improving technology continues to impact the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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