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For the Inventor, By the Inventor

Nei-gun, Japan

Isao Ota

This inventor holds 18 USPTO granted patents and 2 EPO patents, primarily in Polishing Compositions. Top assignee: Nissan Chemical Industries Limited. Active years: 1995-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isao Ota. Retrieved from https://idiyas.com/inventor/isao-ota

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 18

% Patents Active = 50.0


Average Co-Inventor Count = 3.3

ph-index = 10

Forward Citations = 228(Granted Patents)


Location History:

  • Funabushi, JP (1996)
  • Funabashi, JP (1995 - 2004)
  • Sodegaura, JP (2009)
  • Nei-gun, JP (2004 - 2011)
  • Toyama, JP (2010 - 2012)

Company Filing History:

goldMedal18 out of 1,235 
 
Nissan Chemical Industries Limited
 patents

Years Active: 1995-2012

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Areas of Expertise:
Polishing Composition
Cerium Oxide
Abrasive Compound
Alumina Powder
Ball Mill
Zinc Antimonate
Fine Particles
Crystalline Ceric Oxide
Gas Sensor
Milling Method
Production Process
18 patents (USPTO):Explore Patents
1. 8323368 - Production method of polishing composition (2012-12-04),
2. 7887714 - Cerium oxide sol and abrasive (2011-02-15),
3. 7678703 - Production method of polishing composition (2010-03-16),
4. 7578862 - Abrasive compound for glass hard disk platter (2009-08-25),
5. 7484679 - Method of milling cerium compound by means of ball mill (2009-02-03),
6. 7431758 - Cerium oxide particles and production method therefor (2008-10-07),
7. 6887289 - Cerium oxide sol and abrasive (2005-05-03),
8. 6719819 - Polishing composition (2004-04-13),
9. 6706082 - Crystalline ceric oxide sol and process for producing the same (2004-03-16),
10. 6440187 - Alumina powder, process for producing the same and polishing composition (2002-08-27),
11. 6398827 - Polishing composition (2002-06-04),
12. 6372003 - Polishing abrasive of crystalline ceric oxide particles having surfaces modified with hydroxyl groups (2002-04-16),
13. 6311545 - Anhydrous zinc antimonate semiconductor gas sensor and method for producing the same (2001-11-06),
14. 6149888 - Method of producing anhydrous zinc antimonate (2000-11-21),
15. 6007592 - Polishing composition for aluminum disk and polishing process therewith (1999-12-28),

Title: Isao Ota: Innovator in Polishing Composition Technology

Introduction

Isao Ota is a prominent inventor based in Nei-gun, Japan. He has made significant contributions to the field of polishing compositions, holding a total of 18 patents. His work focuses on enhancing the efficiency and effectiveness of polishing materials used in various industries.

Latest Patents

One of Ota's latest patents is a production method for a polishing composition. This invention addresses the need for a method that achieves a high polishing speed while minimizing surface failures on polished surfaces. The method involves the use of zirconia oxide sol and includes specific processes such as baking zirconium compounds at controlled temperatures and wet-grinding to achieve desired particle sizes. This innovative approach is crucial for applications in semiconductor devices and other high-precision industries.

Career Highlights

Ota is currently associated with Nissan Chemical Industries Limited, where he continues to develop advanced materials for polishing applications. His expertise in the field has positioned him as a key figure in the innovation of polishing technologies.

Collaborations

Throughout his career, Ota has collaborated with notable colleagues, including Tohru Nishimura and Kenji Tanimoto. These partnerships have contributed to the advancement of polishing composition technologies and have fostered a collaborative environment for innovation.

Conclusion

Isao Ota's contributions to the field of polishing compositions demonstrate his commitment to innovation and excellence. His patents reflect a deep understanding of material science and a dedication to improving industrial processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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