Berlin, Germany

Iris Barz


 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2015

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Iris Barz

Introduction

Iris Barz is a notable inventor based in Berlin, Germany. She has made significant contributions to the field of plating technology, particularly through her innovative patent. Her work exemplifies the intersection of chemistry and engineering, showcasing her expertise and dedication to advancing industrial processes.

Latest Patents

Iris Barz holds a patent for an immersion tin or tin alloy plating bath with improved removal of cuprous ions. This invention involves a unique formulation that includes at least one aromatic sulfonic acid, a first precipitation additive, and a second precipitation additive. The first precipitation additive is an aliphatic poly-alcohol compound, an ether thereof, or a polymer derived from it, with an average molecular weight ranging from 62 g/mol to 600 g/mol. The second precipitation additive is a polyalkylene glycol compound with an average molecular weight between 750 and 10,000 g/mol. This innovative approach enhances the efficiency and effectiveness of the plating process.

Career Highlights

Iris Barz is currently employed at Atotech Deutschland GmbH, a leading company in the field of specialty chemicals and equipment for the electronics industry. Her role at Atotech allows her to apply her inventive skills and contribute to the development of advanced plating solutions.

Collaborations

Iris has collaborated with several talented individuals in her field, including her coworkers Arnd Kilian and Markus Muskulus. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Iris Barz's contributions to the field of plating technology through her patent demonstrate her commitment to innovation and excellence. Her work not only advances industrial processes but also inspires future generations of inventors.

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