Suwon, South Korea

Ireh Seo

This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignees: Industry-Academic Cooperation Foundation, University, Samsung Electronics Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ireh Seo. Retrieved from https://idiyas.com/inventor/ireh-seo

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Ireh Seo - Innovator in Semiconductor Processing

Introduction

Ireh Seo is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor processing, particularly through his innovative methods and systems.

Latest Patents

Ireh Seo holds a patent for a "Semiconductor process system and method of cleaning the same." This patent describes a method of cleaning a semiconductor processing system, which includes applying vacuum pressure to a supply pipeline that transfers process fluid to a process chamber. The method also involves purging the supply pipeline with a cleaning gas, ensuring efficient operation and maintenance of semiconductor systems. He has 1 patent to his name.

Career Highlights

Throughout his career, Ireh Seo has worked with prominent organizations, including Samsung Electronics Ltd. and the Industry-Academic Cooperation Foundation at a university. His experience in these institutions has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Ireh Seo has collaborated with talented individuals in his field, including Chang-Ha Lee and Taeung Yoon. These partnerships have contributed to the advancement of semiconductor processing technologies.

Conclusion

Ireh Seo's work in semiconductor processing exemplifies the impact of innovation in technology. His contributions continue to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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