The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 14, 2026

Filed:

May. 25, 2023
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Ireh Seo, Suwon-si, KR;

Chang-Ha Lee, Seoul, KR;

Taeung Yoon, Suwon-si, KR;

Rak-Young Jeon, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/52 (2006.01); H10P 72/00 (2026.01);
U.S. Cl.
CPC ...
C23C 16/4405 (2013.01); C23C 16/4408 (2013.01); C23C 16/52 (2013.01); H10P 72/0414 (2026.01);
Abstract

A method of cleaning a semiconductor processing system may include applying a vacuum pressure to a supply pipeline through which a process fluid is transferred to a process chamber and purging the supply pipeline with a cleaning gas, wherein the purging the supply pipeline with the cleaning gas includes by supplying the cleaning gas to a front end of the supply pipeline and discharging the cleaning gas supplied to the supply pipeline by applying an atmospheric pressure from a back end of the supply pipeline.


Find Patent Forward Citations

Seo, Ireh. (2026). Semiconductor process system and method of cleaning the same (U.S. Patent No. 12680161). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12680161

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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