Company Filing History:
Years Active: 2005-2008
Title: The Innovations of Ingo Aller
Introduction
Ingo Aller, an inventor based in Weil im Schönbuch, Germany, has made notable advancements in the field of FinFET integrated circuit design. With a total of two patents to his name, Aller's work demonstrates a commitment to enhancing the performance and efficiency of semiconductor technologies.
Latest Patents
Aller's most recent patents showcase innovative methods and devices for automating layer generation in double-gate FinFET designs. His first patent focuses on a combined cell structure that houses two single cell structures at the first design hierarchy. This design is crucial for maintaining compliance with fin topology design rules in overlapping regions. By delegating fin generation to another design hierarchy, his invention ensures the creation of a single combined fin for both structures.
In another significant patent, Aller introduces the concept of multi-height FinFETs. This invention features a FinFET device with fins of different heights, each with designated channel, source, and drain regions. The unique arrangement allows for improved tuning of transistor performance while effectively determining the total channel width based on the height ratio of the fins.
Career Highlights
Aller is currently associated with the International Business Machines Corporation (IBM), where he continues to push the boundaries of semiconductor technology through innovative engineering and design. His work not only enhances the functionality of memory-driven applications but also contributes to the progression of the industry overall.
Collaborations
Throughout his career, Aller has collaborated with esteemed colleagues such as Joachim Keinert and Thomas Ludwig. These partnerships reflect a strong network within the technology sector, allowing for the exchange of ideas and furthering advancements in FinFET design.
Conclusion
Ingo Aller exemplifies the innovative spirit of modern inventors. With his significant contributions to FinFET technology at IBM, he plays a vital role in the future of semiconductor design. His patents not only reflect personal achievement but also pave the way for advancements in electronic devices worldwide.